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¼Ò·®ÀÇ Prototype ĨÀ» °æÁ¦ÀûÀÎ °¡°ÝÀ¸·Î °øÁ¤(MPW)
Full-Custom, Standard Cell, Customer Tooling(Wafer)
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Dedicated Run(COT :Customer Owned Tooling) °¡´É
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CMOS Analog, Digital
CMOS RF
Image IC
CCD ÀÌ¿ë Display Chips
MEMS Device
GaAs, SiGe °øÁ¤ ¹× Device

 

 

 

 

 

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  - ETRI, KETI, KT(Çѱ¹Åë½Å), KERI(Çѱ¹Àü±â¿¬±¸¿ø), »ï¼ºÁ¾±â¿ø, Analog Chips,
     Æ÷Ç×°ø´ë, KAIST, °æºÏ´ë, ±¤¿î´ë

 

 

 

Available Fabrication Processes

Vendor Feature Size Metal Layers Voltage Description
AMIS 0.35 4 3.3 NPN, PNP, capacitor, I3T80
  4 3.3 2-poly, capacitor, C3O
The C3O process is available for dedicated runs, but not multi-project wafer runs.

0.50 3 5.0 2-poly, resistor, C5F/N
0.70 3 100 1-poly, resistor, I2T100
1.50 2 5.0 2-poly, NPN ABN

TSMC 0.13 8 1.2/2.5 LO, salicide block, varactor, non-epitaxial wafers (epitaxial available at additional cost), CL013G

8 1.2/2.5 MM, MiM capacitor, RPO, deep n-well, inductor, non-epitaxial wafer CR013G (CM013G)

8 1.5/2.5 Low-power logic, non-epitaxial wafers (epitaxial available at additional cost), CL013LP

8 1.0/2.5 Low-voltage logic, non-epitaxial wafers (epitaxial available at additional cost), CL013LV

0.18 6 1.8/3.3 LO, RPO, non-epitaxial wafers (epitaxial available at additional cost), CL018

6

1.8/3.3

MM, MiM capacitor, RPO, deep n-well, inductor, non-epitaxial wafer, CR018 (CM018)

6

1.8/3.3

Low-power logic, non-epitaxial wafers (epitaxial available at additional cost), CL018LP

6

1.5/3.3

Low-voltage logic, non-epitaxial wafers (epitaxial available at additional cost), CL018LV

6

1.8/5/32

High-voltage, non-epitaxial wafers (epitaxial available at additional cost), CL018HV

0.25 5 2.5/3.3 LO, RPO, non-epitaxial wafers (epitaxial available at additional cost), CL025

5

2.5/3.3

MM, MiM capacitor, RPO, deep n-well, varactor, inductor, non-epitaxial wafer, CR025 (CM025)

0.35 4 3.3/5.0 LO, RPO, 5.0 V ESD, non-epitaxial wafers (epitaxial available at additional cost), CL035 (TSMC35_SIL)

4

3.3/5.0

MM, PiP (2-poly), 5.0 V ESD, non-epitaxial wafers (epitaxial available at additional cost), CM035 (TSMC35_P2)

4

3.3/12

High-voltage, 2 poly, non-epitaxial wafers (epitaxial available at additional cost), CL035HV


IBM (CMOS) 90 nm 8 1.0 (M1, M2, M3, M4, M5, M6, M1_2B, M2_2B) 9SF (logic)

  8 1.0 (M1, M2, M3, M4, M5, M6, M1_2B, M2_2B) 9LP (low-power logic)

  9 1.0 (M1, M2, M3, M4, M5, M1_2B, M2_2B, M1_4B, M2_4B) 9RF (mixed-mode)
0.13 8 1.2/2.5 (M1, M2, M3, M4, M5, M6, MQ, LM), 8RF-LM (logic)

  8 1.2/2.5 (M1, M2, M3, MQ, MG, LY, E1, MA), 8RF-DM (mixed-mode)

0.18

6 1.8/3.3 (M1, M2, M3, M4, M5, LM), 7SF (logic)

  6 1.8/3.3 (M1, M2, M3, M4, MT, ML), 7RF (mixed-mode)

0.25 5 2.5/3.3 MiM capacitor (Q3/Q4, nitride), 6RF (mixed-mode)

IBM (CIMG)

0.18 6 1.8/3.3 (0.13 µm M1, M2, M3, MZ), CIMG7HY (CMOS Image Sensor)
 
IBM (SiGe) 0.13 7 1.2/2.5 (M1, M2, M3, M4, MQ, LY, AM), MiM capacitor 8HP

0.18 7 1.8/3.3 (M1, M2, M3, M4, MT (=LY), E1, MA), MiM capacitor (QT/HT, 4.1 fF/µm²), 7WL

5 1.8, 2.5/3.3 (M1, M2, MT, LY, AM), 7HP

0.25 7 2.5 (M1, M2, M3, M4, MT, E1, MA), MiM capacitor (Q5 to MT, nitride), 6DM

6 2.5 (M1, M2, M3, M4, MT, AM), MiM capacitor (Q5 to MT, nitride), 6HP

0.35 4 3.3/5 (M1, M2, MT, AM), MiM capacitor (QT/HT, nitride), 5HPE

0.50 5 3.3 (M1, M2, MT, E1, MA), MiM capacitor (H3/Q3 to MT, nitride), 5DM

4 3.3 (M1, M2, MT, AM), MiM capacitor (Q2 to M2, nitride), 5AM

4 3.3 (M1, M2, MT, AM), MiM capacitor, 5PA

3 3.3 (M1, M2, LM), MiM capacitor (Q2 to M2), 5HP

austriamicrosystems
  0.35 4 3.3/5 Hires Poly, MiM, CMOS, C35B4C3
    4 3.3/5 CMOS-Opto, PiP, C35B4O1
    4 3.3/5 Thick metal 4, MiM, CMOS, C35B4M3
    4 50 HV-CMOS, Hires poly, H35B4D3
    4 2.5 SiGe BiCMOS, MiM, S35D4
  0.80 2 50 HV CMOS, CXZ

 

 

 

 

Multi-Project Wafer (MPW)
2007 Fabrication Schedule

Last Update: 2007 Mar 02 (bb)
Runs close at 1 PM PT (Pacific/California Time) on the date listed.

Processes Customer Submission Date
2007
AMIS Jan Feb Mar Apr May Jun Jul Aug Sep Oct Nov Dec
I3T80 0.35   26     21     27     26  
C5F/N 0.50 8 12 19 23   4 16 27   8 26  
I2T100 0.70 16     2   11   20   29    
ABN 1.50 16   5 16 28   9 20   1 12  
TSMC Jan Feb Mar Apr May Jun Jul Aug Sep Oct Nov Dec
CR013G (CM013G), CLO13G 0.13 8   12   7     13¹     26¹  
CR013LP 0.13 8   12   7     13¹     26¹  
CR013LV 0.13 8   12   7     13¹     26¹  
CR018 (CM018), CLO18 0.18 22   19   21   23   17   12  
CLO18LP 0.18   12     7     21¹     12¹  
CLO18LV 0.18 22   19   21   23¹   17¹   12¹  
CLO18HV 0.18   12     7     27¹     19¹  
CR025 (CM025), CLO25 0.25   12   9   11   27     5  
CM035, CLO53 0.35 16   5     4     4     3
CLO35HV 0.35     5     4        
IBM BiCMOS SiGe Jan Feb Mar Apr May Jun Jul Aug Sep Oct Nov Dec
8HP 0.13               6     6  
8WL 0.13               27       3
7HP 0.18 See Taxi Runs
7WL 0.18 22   12   14   16   10   12  
6HP 0.25 See Taxi Runs
6WL 0.25               27        
5HPE 0.35 16       7     6     5  
5DM 0.50 See Taxi Runs
5HP/5AM 0.50 8       7       4      
5PA 0.50 See Taxi Runs
    See Taxi Runs for additional IBM run dates.
IBM CMOS Jan Feb Mar Apr May Jun Jul Aug Sep Oct Nov Dec
10LP/RF 65 nm                       3
9SF 90 nm 8     23     23     22    
9RF 90 nm 16   5     4     4     3
9LP 90 nm 16   5     4     4     3
8RF-DM 0.13   5 26   28   30   24   26  
8RF-LM 0.13   12           6        
7SF 0.18 See Taxi Runs
7RF 0.18   20   16   18   20   15   3
6RF 0.25 See Taxi Runs
    See Taxi Runs for additional IBM run dates.

IBM CIMG

Jan Feb Mar Apr May Jun Jul Aug Sep Oct Nov Dec

CIMG7HY 0.18

    5       9       5  
austriamicrosystems Jan Feb Mar Apr May Jun Jul Aug Sep Oct Nov Dec
C35B4C3 0.35 CMOS 16   19 16   18 16   17 15    
C35B4O1 0.35 CMOS-Opto 16   19 16   18 16   17 15    
C35B4M3 0.35 Thick Metal CMOS   26       4     4   12  
H35B4D3 0.35 HV CMOS 29     23     30     29    
S35D4 0.35 SiGe   26       4     4   12  
CXZ 0.80 HV CMOS     12     26       8    
  Jan Feb Mar Apr May Jun Jul Aug Sep Oct Nov Dec

 ¹ Estimate.

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